IOP Conference Series Materials Science and Engineering · 2015 · 29 citations · 16 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials CharacterizationOptical MaterialsThin FilmsOptical Thin FilmsOxide SemiconductorsSemiconductor Thin FilmsThin Film Optical PropertiesThin-film DepositionThin-film MaterialsCrystalline StructureOptical PropertiesSiliconSputteringThin Oxide FilmsThin Oxide LayersX-ray Diffraction AnalysisZinc Oxides
ZnO thin films were deposited on glass, quartz and silicon substrates under the same growth condition by r.f. magnetron sputtering technique using a high purity (99.99%) ZnO target of 2-in. diameter and 3 mm thickness in an Argon atmosphere with sputtering power of 50W and sputtering pressure of 2×10−2 Torr. A systematic study has been made of the influence of substrate on the film structural properties. Crystalline properties of ZnO films as a function of deposited substrate were investigated using X-ray diffraction. XRD analysis revealed that the deposited films were polycrystalline in nature with strong preferential orientation of grains along the c-axis. The micro structural parameters, such as the lattice constant, crystallite size, stress and strain are calculated. The effect of substrate on the deposited films was discussed. All the films present a high transmittance of above 90% in the wavelength range of the visible spectrum and sharp absorption edge near 380 nm.
16