Etch and strip induced material modification of porous low-k (k=2.2) dielectric - Concepedia

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Etch and strip induced material modification of porous low-k (k=2.2) dielectric

31

Citations

8

References

2004

Year

Yuki Furukawa, R.A.M. Wolters, H.H.A.J. Roosen, J. H. M. Snijders, R.J.O.M. Hoofman

Microelectronic Engineering

Materials EngineeringMaterials SciencePorous Low-kDielectricsEngineeringSurface ScienceApplied PhysicsMicrowave CeramicPlasma EtchingMaterial ModificationElectrical PropertyElectrical Insulation

References

	Year	Citations

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