Publication | Closed Access
Soluble polycyclosilane–polysiloxane hybrid material and silicon thin film with optical properties at 193 nm and etch selectivity
12
Citations
17
References
2014
Year
Optical MaterialsEngineeringOrganic ElectronicsSemiconductor MaterialsSilicon Thin FilmOptoelectronic DevicesChemistryElectronic DevicesOptical PropertiesHybrid MaterialsPolymer ChemistryNanolithography MethodMaterials SciencePhotonic MaterialsOptoelectronic MaterialsOrganic SemiconductorThin Film MaterialsCurrent Semiconductor LithographyElectronic MaterialsMicrofabricationPolymer ScienceApplied PhysicsNew ClassThin FilmsSilicon Thin FilmsEtch SelectivityOrganic-inorganic Hybrid Material
Silicon thin films that fulfil the needs of current semiconductor lithography were prepared from a new class of polycyclosilane–polysiloxane hybrid materials.
| Year | Citations | |
|---|---|---|
Page 1
Page 1