Concepedia

Characterization of HfO2 dielectric films with low energy SIMS

Z. X. Jiang, K. Kim, J. Lerma, D. Sieloff, H. Tseng, R. I. Hegde, T. Y. Luo, Jiaqi Yang, Dina H. Triyoso, Philip J. Tobin

Applied Surface Science · 2006 · 16 citations · 0 references

DOI

Concepts