Effect of abrasive particle concentration on preliminary chemical mechanical polishing of glass substrate

Chemical mechanical planarization for microelectronics applications

Parshuram B. Zantye, Ashok Kumar, A. K. Sikder · Materials Science and Engineering R Reports · 2004 · 612 citations

Engineering, Materials Engineering, Materials Science +14

Chemical mechanical polishing (CMP) anisotropy in sapphire

Honglin Zhu, Luiz A. Tessaroto, Robert Sabia et al. · Applied Surface Science · 2004 · 178 citations

Engineering, Materials Engineering, Materials Science +9

Ceria concentration effect on chemical mechanical polishing of optical glass

Liangyong Wang, Kailiang Zhang, Zhitang Song et al. · Applied Surface Science · 2006 · 136 citations

Natural Sciences, Materials Engineering, Materials Science +13

Preparation of alumina/silica core-shell abrasives and their CMP behavior

Hong Lei, Pengzhen Zhang · Applied Surface Science · 2007 · 79 citations

Natural Sciences, Materials Engineering, Materials Science +14

Measuring zeta potential in concentrated industrial slurries

Robert J. Hunter · Colloids and Surfaces A Physicochemical and Engineering Aspects · 2001 · 69 citations

Engineering, Chemical Engineering, Chemistry +12