Publication | Closed Access
Comparison of Ultraviolet Photo-Field Effects between Hydrogenated Amorphous Silicon and Amorphous InGaZnO<sub>4</sub> Thin-Film Transistors
127
Citations
13
References
2009
Year
H TftsEngineeringOrganic ElectronicsOptoelectronic DevicesSilicon On InsulatorUltraviolet Photo-field EffectsSemiconductor DeviceOptical PropertiesHydrogenated Amorphous SiliconCompound SemiconductorElectrical EngineeringPhysicsOrganic SemiconductorA-igzo TftsMicroelectronicsApplied PhysicsUv IlluminationAmorphous SolidOptoelectronics
We discuss the ultraviolet (UV) photo-field effects in amorphous InGaZnO4 thin-film transistors (a-IGZO TFTs) compared with those in hydrogenated amorphous silicon (a-Si:H) TFTs. It is shown that the UV illumination induces a much more significant threshold voltage (Vt) decrease and OFF-current increase for the a-IGZO TFTs than for the a-Si:H TFTs. The significant Vt decrease is found to take several tens of min to return to the initial state after switching off the UV light. A qualitative model is introduced to explain the photoresponse unique to the a-IGZO TFTs.
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