Applied Physics Letters · 1999 · 104 citations · 7 references
Natural SciencesMaterials EngineeringMaterials ScienceSurface ChemistrySurface ScienceThin FilmsChemical Vapor DepositionPlasma Surface TreatmentPlasma-surface InteractionsSurface Chemistry Of SolidsSurface PhysicsThin-film DepositionDepth Profile AnalysisElectron AffinityHexagonal Boron NitrideNitride Thin FilmsNitrides Thin FilmsPlasma-assisted Chemical Vapor DepositionSurface ConditioningUltraviolet Photoelectron Spectroscopy
The surface conditions favoring a negative electron affinity (NEA) on hexagonal boron nitride (h-BN) grown by radio-frequency plasma-assisted chemical vapor deposition (CVD) have been investigated by ultraviolet photoelectron spectroscopy. The NEA condition on the h-BN film appears to be resistant to oxygen-plasma or in-vacuo atomic oxygen treatment. It is not certain whether the segregation of bulk hydrogen onto the surface helps to promote the NEA; the depth profile of the deposited film reveals about 0.01%–0.1% atomic concentration of hydrogen. High temperature annealing at 1100 °C results in a positive electron affinity surface (PEA). Reexposure of PEA surface to atomic hydrogen at room temperature regenerates the NEA condition. This is evident of the role of superficial hydrogen in promoting NEA on the h-BN film.
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Observation of a negative electron affinity for boron nitride
Matthew Powers, Mark C. Benjamin, Lisa M. Porter et al. · Applied Physics Letters · 1995 · 175 citations
R. Trehan, Y. Lifshitz, J. W. Rabalais · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 159 citations
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