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High Mobility Bilayer Metal–Oxide Thin Film Transistors Using Titanium-Doped InGaZnO
64
Citations
16
References
2014
Year
Materials ScienceIgzo Thickness ModulationElectrical EngineeringElectronic DevicesEngineeringElectronic MaterialsOxide ElectronicsApplied PhysicsGallium OxideSemiconductor MaterialThin Film Process TechnologyThin FilmsConventional Igzo TftsHigh Resolution DisplayThin Film ProcessingSemiconductor Device
We report a high performance indium-gallium-zinc oxide (IGZO)/IGZO:Ti bilayer metal–oxide thin-film transistor (TFT) with a low drive voltage of <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">${<}{\rm 2}~{\rm V}$</tex></formula> . Compared with conventional IGZO TFTs, the novel bilayer metal–oxide TFTs through IGZO thickness modulation can reach the lowest off current of <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">$1.6\times 10^{-11}~{\rm A}$</tex></formula> , smallest sub-threshold swing of 73 mV/decade, and highest mobility of 63 <formula formulatype="inline" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"><tex Notation="TeX">${\rm cm}^{2}$</tex></formula> /Vs, which may create the potential application for high resolution display.
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