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High rate etching of sapphire wafer using Cl2/BCl3/Ar inductively coupled plasmas

DOI

38

Citations

4

References

2001

Year

Youngje Sung, H.S. Kim, Y.H. Lee, Jae‐Wook Lee, Seung‐Hoon Chae, Y.J. Park, G.Y. Yeom
Materials Science and Engineering B

References

YearCitations

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