Extraordinary deposition rate of diamond-like carbon film using HIPIMS technology

American Institute of Physics Handbook

Irving E. Dayton · American Journal of Physics · 1964 · 3K citations

Engineering, Nuclear Physics, Physics +8

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1K citations

Electrical Engineering, Engineering, Magnetron Sputter Technique +3

Energy dependence of the ion-induced sputtering yields of monatomic solids

N. Matsunami, Yasunori Yamamura, Yukikazu Itikawa et al. · Atomic Data and Nuclear Data Tables · 1984 · 788 citations

Materials Engineering, Materials Science, Ion Implantation +9

Influence of high power densities on the composition of pulsed magnetron plasmas

Arutiun P. Ehiasarian, R. New, W.‐D. Münz et al. · Vacuum · 2002 · 297 citations

Magnetism, Electrical Engineering, Engineering +6

Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge

Jones Alami, Ulf Helmersson · Surface and Coatings Technology · 2002 · 207 citations

Electrical Engineering, Plasma Parameters, Engineering +7