Spatial-phase-locked electron-beam lithography and x-ray lithography for fabricating first-order gratings on rib waveguides

Abstract

The two basic structural elements of the integrated resonant channel-dropping filter are the rib waveguides and the first-order Bragg gratings. Spatial-phase-locked electron-beam lithography is used to write the Bragg grating patterns with a coherence better than λ0/150, and x-ray nanolithography is used to transfer the gratings onto optically patterned rib waveguides. These technologies are successfully combined to demonstrate a process by which channel-dropping filters and related devices can be fabricated.