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Structural properties of SrO thin films grown by molecular beam epitaxy on LaAlO3 substrates
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Citations
14
References
2006
Year
Optical MaterialsEngineeringThin Film Process TechnologySro Thin FilmsThick Sro FilmsMolecular Beam EpitaxyEpitaxial GrowthThin Film ProcessingMaterials ScienceOxide HeterostructuresStructural PropertiesOxide ElectronicsSro FilmsCrystallographyMaterial AnalysisSurface ScienceApplied PhysicsX-ray DiffractionThin Films
SrO films were grown on LaAlO3 substrates by molecular beam epitaxy and characterized using reflection high-energy electron diffraction (RHEED) and x-ray diffraction (XRD). The evolution of the RHEED pattern is discussed as a function of film thickness. 500Å thick SrO films were relaxed and exhibited RHEED patterns indicative of an atomically smooth surface having uniform terrace heights. Films had the epitaxial relationship (001)SrO‖(001)LaAlO3; [010]SrO‖[110]LaAlO3. This 45° in-plane rotation minimizes mismatch and leads to films of high crystalline quality, as verified by Kikuchi lines in the RHEED patterns and narrow rocking curves of the (002) XRD peak.
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