Atomic layer deposition of Y<sub>2</sub>O<sub>3</sub> films using heteroleptic liquid (iPrCp)<sub>2</sub>Y(iPr-amd) precursor

In‐Sung Park, Yong Chan Jung, Sejong Seong, Jinho Ahn, Jiehun Kang, Wontae Noh, Clément Lansalot‐Matras

Journal of Materials Chemistry C · 2014 · 59 citations · 37 references

Concepts

Abstract

The Y<sub>2</sub>O<sub>3</sub> films grown with a new and heteroleptic liquid Y precursor, (iPrCp)<sub>2</sub>Y(iPr-amd), have been investigated with chemical properties of precursor, atomic layer deposition process, and material characterization of the deposited film and its non-volatile resistive switching behaviour.

References

37