Atomic layer controlled growth of Si3N4 films using sequential surface reactions - Concepedia

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Atomic layer controlled growth of Si3N4 films using sequential surface reactions

96

Citations

16

References

1998

Year

J. W. Klaus, A. W. Ott, Anne C. Dillon, Steven M. George

Surface Science

Materials ScienceSi3n4 FilmsEngineeringNanotechnologySurface ScienceApplied PhysicsSiliceneSequential Surface ReactionsThin FilmsChemical DepositionAtomic LayerChemical Vapor DepositionSilicon On InsulatorThin Film Processing

References

	Year	Citations

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