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Characteristics of 0.8- and 0.2- mu m gate length In/sub x/Ga/sub 1-x/As/In/sub 0.52/Al/sub 0.48/As/InP (0.53>or=x>or=0.70) modulation-doped field-effect transistors at cryogenic temperatures
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Citations
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References
1992
Year
Semiconductor TechnologyElectrical EngineeringEngineeringCryogenic TemperaturesElectronic EngineeringBias Temperature InstabilityApplied PhysicsCutoff FrequencyIntegrated CircuitsInp-based Pseudomorphic ModfetsMicroelectronicsModulation-doped Field-effect TransistorsIntrinsic Cutoff FrequencySemiconductor Device
The performance characteristics of InP-based pseudomorphic MODFETs with varying the In composition (0.53<or=x<or=0.70), which changes the strain in the channel, were studied. The temperature was varied in the range of 40-300 K, and the devices had gate lengths L/sub g/ of 0.8 and 0.2 mu m. The analysis predicts an increase in the intrinsic cutoff frequency with increasing In composition and decreasing temperature and gate length. Also, the analysis predicts that the increase in cutoff frequency with decreasing temperature is less significant with increasing In composition and decreasing gate length. Preliminary experimental results show that as In composition increases from 0.53 to 0.70, f/sub T/ increases by 30-40%, and as the temperature decreases from 300 to 40 K, f/sub T/ improves by 15-30%, both for 0.8- and 0.2- mu m devices.<<ETX>>
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