Membranes of SiO N with 3D topography formed by PECVD for MEMS applications

On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films

M.I. Alayo, I. Pereyra, Wanderlã L. Scopel et al. · Thin Solid Films · 2002 · 157 citations

Natural Sciences, Materials Engineering, Materials Science +14

Controlling the plasma chemistry of silicon nitride and oxide deposition from silane

Donald L. Smith · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 77 citations

Natural Sciences, Chemistry, Materials Science +17

Thick SiO x N y and SiO 2 films obtained by PECVD technique at low temperatures

M.I. Alayo, I. Pereyra, M.N.P. Carreño · Thin Solid Films · 1998 · 67 citations

Natural Sciences, Materials Engineering, Materials Science +15

High quality low temperature DPECVD silicon dioxide

I. Pereyra, M.I. Alayo · Journal of Non-Crystalline Solids · 1997 · 66 citations

Engineering, Materials Engineering, Materials Science +7

Deposition of thick TEOS PECVD silicon oxide layers for integrated optical waveguide applications

Douglas Bulla, Nilton Itiro Morimoto · Thin Solid Films · 1998 · 52 citations

Engineering, Materials Engineering, Materials Science +12