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Application of a focused ion beam system to defect repair of VLSI masks
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1985
Year
Ion ImplantationEngineeringElectron-beam LithographyBeam LithographyMicrofabricationApplied PhysicsVlsi MasksChromium-on-glass MaskVlsi Circuit PatternIntegrated CircuitsIon BeamSubmicrometer Diameter BeamsMicroelectronicsNanolithography Method
A scanning ion beam lithography system has been used for the rework of chromium-on-glass mask plates to repair defects in the VLSI circuit pattern. By using submicrometer diameter beams of gallium and of gold ions to sputter selected areas of the mask, both clear and opaque areas have been generated on the substrate.