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Deposition of Thin Films of Gallium Sulfide from a Novel Liquid Single-Source Precursor, Ga(SOCNEt2)3, by Aerosol-Assisted CVD
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1999
Year
Materials ScienceIi-vi SemiconductorFace-centered Cubic GasTransition Metal ChalcogenidesEngineeringGallium SulfideSurface ScienceApplied PhysicsOptoelectronic MaterialsAerosol-assisted CvdGallium OxideChemistryThin FilmsChemical DepositionChemical Vapor DepositionGroup Iii Chalcogenides
Group III chalcogenides are interesting materials for photovoltaic and optoelectronic devices. Here the synthesis and use of a novel, single-source precursor for the deposition of face-centered cubic GaS by aerosol-assisted CVD is described. The films show a high degree of orientation and an unusual spherical morphology arranged in a reasonably uniform array on the substrate (see Figure).