Michael Lazell

The growth of thin films of copper chalcogenide films by MOCVD and AACVD using novel single-molecule precursors

Michael Kemmler, Michael Lazell, Paul O’Brien et al. · Journal of Materials Science Materials in Electronics · 2002 · 77 citations

Formation of ring-expanded products from certain combinations of tetraphenyldisiloxanediolates [(Ph₂SiOM′)₂O](M′= Li or Na) and group 4 metal chlorides MCl₄

Michael Lazell, Majid Motevalli, Syed Adnan Alı Shah et al. · Journal of the Chemical Society Dalton Transactions · 1996 · 28 citations

Materials Science, Inorganic Chemistry, Engineering +13

Deposition of Thin Films of Gallium Sulfide from a Novel Liquid Single-Source Precursor, Ga(SOCNEt2)3, by Aerosol-Assisted CVD

G.A. Horley, Michael Lazell, Paul O’Brien · Chemical Vapor Deposition · 1999 · 25 citations

Materials Science, Ii-vi Semiconductor, Face-centered Cubic Gas +13

Lithium bridged cyclosiloxy-niobium(V) and -tantalum(V) complexes: thermal decomposition, solid-state and solution structural studies †

Michael Lazell, Majid Motevalli, Syed Adnan Alı Shah et al. · Journal of the Chemical Society Dalton Transactions · 1997 · 24 citations

Materials Science, Inorganic Chemistry, Inorganic Synthesis +12

Synthesis and crystal structure of [K{O(Ph2SiO)2SiPh2OH}] 2·C6H6; the first structurally characterised example of a monometallated derivative of an α,ω-siloxane diol. Solution chemistry in relation to KOH-promoted ring-opening polymerisation of (Ph2SiO)3

Barbara Laermann, Michael Lazell, Majid Motevalli et al. · Journal of the Chemical Society Dalton Transactions · 1997 · 14 citations

Materials Science, Inorganic Chemistry, Proton Nmr +13