Publication | Closed Access
Microstructure of RuO2 layer as diffusion barrier between Al and Si substrate
20
Citations
9
References
1988
Year
Materials ScienceMaterials EngineeringSi SubstrateAluminium NitrideEngineeringDiffusion ResistancePhysicsSurface ScienceApplied PhysicsSemiconductor MaterialRuo2 LayerLayered MaterialEpitaxial GrowthMicrostructureDiffusion Barrier
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