Publication | Closed Access
Microstructure of heteroepitaxial GaN revealed by x-ray diffraction
387
Citations
19
References
2003
Year
Materials ScienceDislocation DensitiesAluminium NitrideEpitaxial GrowthEngineeringPhysicsSurface ScienceApplied PhysicsMosaic StructureX-ray DiffractionAluminum Gallium NitrideGan Power DeviceHigh-resolution X-ray DiffractionCategoryiii-v SemiconductorMicrostructure
The mosaicity of GaN layers grown by metalorganic vapor phase epitaxy, on (0001) sapphire and exhibiting different grain diameters is studied using high-resolution x-ray diffraction. The coherence lengths, the tilt, and the twist of the mosaic structure are determined utilizing data taken in different x-ray scattering geometries. The results of different models, which were applied, are then compared and discussed. The dislocation densities, obtained from the x-ray data, are compared with the results of plan-view transmission electron microscopy and atomic force microscopy.
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