Concepedia

Publication | Closed Access

Surface preparation and interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition

DOI

50

Citations

14

References

2003

Year

Wei‐Bor Tsai, R. J. Carter, Hiroshi Nohira, Matty Caymax, Thierry Conard, V. Cosnier, S. DeGendt, Marc Heyns, J. Pétry, Olivier Richard,
Microelectronic Engineering

References

YearCitations

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