Publication | Closed Access

Tuning of resist slope with hard-baking parameters and release methods of extra hard photoresist for RF MEMS switches

Electrical EngineeringPhotoelectric SensorEngineeringExtra Hard PhotoresistElectron-beam LithographyMicrofabricationApplied PhysicsResist SlopeElectronic PackagingMicroelectronicsOptoelectronicsRf Mems SwitchesMicro-electromechanical SystemRf Subsystem