Concepedia

Publication | Closed Access

Strained Si/SiGe MOS technology: Improving gate dielectric integrity

DOI

24

Citations

26

References

2008

Year

Sarah H. Olsen, Liang Yan, R. Agaiby, Enrique Escobedo‐Cousin, A.G. O’Neill, Per‐Erik Hellström, Mikael Östling, K. Lyutovich, E. Kasper, C. Claeys,
Microelectronic Engineering

References

YearCitations

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