Publication | Closed Access
Atomic layer etching of (100)/(111) GaAs with chlorine and low angle forward reflected Ne neutral beam
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Citations
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References
2008
Year
Electrical EngineeringLow AngleEngineeringPhysicsElectron-beam LithographyBeam LithographySurface ScienceApplied PhysicsAtomic Layer EtchingMolecular Beam EpitaxyNe Neutral BeamPlasma EtchingOptoelectronicsCompound Semiconductor
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