A reflectometer for at-wavelength characterization of XUV-reflection gratings

F. Eggenstein, Peter Bischoff, A. Gaupp, F. Senf, Andréy Sokolov, Thomas Zeschke, F. Schäfers

Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 11 citations · 11 references

Concepts

Abstract

Within our technology center for production of highly efficient precision gratings a versatile 4-circle UHV-reflectometer for synchrotron radiation based at-wavelength characterization has been fabricated. The main feature is the possibility to incorporate real live-sized gratings. The samples are adjustable within six degrees of freedom by a novel UHV-tripod system, and the reflectivity can be measured at all incidence angles for both s- and p-polarization geometry. The reflectometer has been setup in a clean room hutch and it is coupled permanently to the optics beamline PM-1 for the UV and XUV range with the polarization adjustable to either linear or elliptical. The setup will be open to users by the end of 2014.

References

11