Temperature dependence of Raman scattering in single crystal GaN films

Abstract

Micro-Raman scattering from single crystal GaN films, both free-standing and attached to Al2O3 substrates, was performed over the temperature range from 78 to 800 K. These measurements reveal that the Raman phonon frequency decreases and the linewidth broadens with increasing temperature. This temperature dependence is well described by an empirical relationship which has proved to be effective for other semiconductors. The experiments also demonstrate that the strain from Al2O3 substrates compresses the epitaxial GaN in the c-axis direction.