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Dominant rate process of silicon surface etching by hydrogen chloride gas

Materials EngineeringChemical EngineeringEngineeringMicrofabricationHydrogen Chloride GasSurface ScienceApplied PhysicsSilicon SurfaceSemiconductor Device FabricationDominant Rate ProcessSilicon On InsulatorMicroelectronicsPlasma EtchingSurface ProcessingPlasma Processing