High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma

Hypersonic plasma particle deposition of nanostructured silicon and silicon carbide

Nagaraja Rao, N. Tymiak, J. M. Blum et al. · Journal of Aerosol Science · 1998 · 115 citations

Engineering, Materials Engineering, Materials Science +16

High-Rate Thermal Plasma CVD of SiC

Hideyuki Murakami, Toyonobu Yoshida, Kazuo Akashi · Advanced Ceramic Materials · 1988 · 30 citations

Natural Sciences, Materials Engineering, Materials Science +14

Thermal Plasma Chemical Vapor Deposition of Si-Based Ceramic Coatings from Liquid Precursors

E. Bouyer, Günter Schiller, M. Müller et al. · Plasma Chemistry and Plasma Processing · 2001 · 27 citations

Natural Sciences, Materials Engineering, Materials Science +16

Control of substrate temperature during diamond deposition

M. T. Bieberich, Steven L. Girshick · Plasma Chemistry and Plasma Processing · 1995 · 23 citations

Engineering, Materials Engineering, Materials Science +14