Aluminium nitride films deposition by reactive triode sputtering for surface acoustic wave device applications

The tension of metallic films deposited by electrolysis

G. Stoney · Proceedings of the Royal Society of London Series A Containing Papers of a Mathematical and Physical Character · 1909 · 4.8K citations · Full text

Natural Sciences, Chemistry, Materials Science +11

Determination of the thickness and optical constants of amorphous silicon

R. Swanepoel · Journal of Physics E Scientific Instruments · 1983 · 3.9K citations

Natural Sciences, Materials Engineering, Materials Science +17

Reactive DC magnetron sputtering of elemental targets in Ar/N2 mixtures: relation between the discharge characteristics and the heat of formation of the corresponding nitrides

R. Mientus, K. Ellmer · Surface and Coatings Technology · 1999 · 98 citations

Natural Sciences, Materials Science, Physics +12

Effect of substrate composition on the piezoelectric response of reactively sputtered AlN thin films

Judith A. Ruffner, Paul G. Clem, Brace Tuttle et al. · Thin Solid Films · 1999 · 83 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +16

Investigation of aluminum nitride grown by metal–organic chemical-vapor deposition on silicon carbide

Carl‐Mikael Zetterling, Mikael Östling, K. Wongchotigul et al. · Journal of Applied Physics · 1997 · 72 citations

Natural Sciences, Materials Engineering, Materials Science +17