Structural analysis and reduction of in-grown stacking faults in 4H–SiC epilayers

Abstract

We investigated the structure of in-grown stacking faults in the 4H–SiC(0001) epilayers. The in-grown stacking faults nucleate near the substrate/epilayer interface and expand the area with increasing epilayer thickness in a triangular shape. From transmission electron microscope observation, the formation of 1c of 8H polytype was confirmed in the in-grown stacking fault area. We also investigated the dependence of in-grown stacking fault density on the epitaxial growth rate, growth temperature, and substrate surface preparation.