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Strong light-matter coupling at room temperature in simple geometry GaN microcavities grown on silicon
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Citations
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References
2005
Year
Wide-bandgap SemiconductorEngineeringOptical PropertiesReflectance SpectraExciton ModesNanophotonicsPhotonicsElectrical EngineeringPhysicsAluminum Gallium NitrideLight–matter InteractionBack MirrorMicroelectronicsPhotonic DeviceCategoryiii-v SemiconductorRoom TemperatureApplied PhysicsStrong Light-matter CouplingGan Power DeviceSimple Geometry GanOptoelectronics
The reflectance spectra of simple design GaN-based microcavities have been studied in the 5 K–300 K range. The epitaxial structure consists of the silicon substrate and the stack of buffer layers as the back mirror, a GaN active layer, and a 100 Å thick aluminium layer as the top mirror. Active layer thicknesses of λ∕2, λ, or 3λ∕2 were investigated. The samples with GaN thicknesses λ∕2 and λ display an anticrossing behavior between the cavity and exciton modes, with measured Rabi splittings of 47 and 60 meV, respectively, both at 5 K and room temperature.
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