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Raman scattering study of the thermal oxidation of InP
38
Citations
10
References
1980
Year
EngineeringOxidation ResistanceMinor Film ConstituentThermal OxidationChemistryOptical PropertiesThermodynamicsPhosphoreneThin Film ProcessingMaterials ScienceElemental Red PhosphorusOxide ElectronicsMaterial AnalysisPhysicochemical AnalysisNatural SciencesSpectroscopySurface ScienceThin FilmsChemical KineticsReflection Raman ScatteringSpectroscopic Method
Reflection Raman scattering has been used to study thermally grown air-oxidized films on InP. Elemental red phosphorus is detected in films grown between 350 and 550 °C. At oxidation temperatures exceeding 550 °C, InPO4 is observed with some In2O3 also present as a minor film constituent.
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