Low-cost multilevel microchannel lab on chip: DF-1000 series dry film photoresist as a promising enabler

Abstract

We demonstrate the use of a novel dry film photoresist DF-1000 series for the fabrication of multilevel microfluidic devices by combining a standard lithography technique and lamination technology. The optimization of the technological process enables achievement of high aspect ratio structures: 7 : 1 for free standing structures and 5 : 1 for channel structures. We proved that DF films feature a low autofluorescence level, similar to that of the SU-8 resist and compatible with most lab-on-a-chip applications. The chemical stability against aggressive solvents was also investigated. Last but not least, the non-cytotoxic effect according to ISO 10993-5 on the development of L-929 mouse fibroblast cells was established. Ultimately, we showed that this low-cost material combined with multilevel lamination and UV-lithography techniques allowed the fabrication of 3D microfluidic mixers and opened the way to perform microfluidics in three dimensions.