Applied Physics Letters · 2006 · 56 citations · 11 references
Materials ScienceChemical EngineeringEngineeringLow Sno2 ConcentrationNanomaterialsTin DioxideMicrofabricationPlasma CombustionGas Discharge PlasmaNonthermal PlasmaPlasma ControlPlasma ProcessingEuv Conversion EfficiencyPlasma Application
We demonstrated a low-debris, efficient laser-produced plasma extreme ultraviolet (EUV) source by use of a regenerative liquid microjet target containing tin-dioxide (SnO2) nanoparticles. By using a low SnO2 concentration (6%) solution and dual laser pulses for the plasma control, we observed the EUV conversion efficiency of 1.2% with undetectable debris.
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X-ray emission in laser-produced plasmas
D. Colombant, Giustino Tonon · Journal of Applied Physics · 1973 · 336 citations
Extreme Ultraviolet Lithography
Jeffrey Bokor · 1997 · 256 citations