Effects of low-temperature ozone annealing on operation characteristics of amorphous In–Ga–Zn–O thin-film transistors - Concepedia

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Effects of low-temperature ozone annealing on operation characteristics of amorphous In–Ga–Zn–O thin-film transistors

43

Citations

13

References

2011

Year

Keisuke Ide, Y. Kikuchi, Kenji Nomura, Toshio Kamiya, Hideo Hosono

Thin Solid Films

Materials ScienceLow-temperature OzoneElectrical EngineeringEngineeringOxide ElectronicsApplied PhysicsOperation CharacteristicsGallium OxideThin Film Process TechnologyThin FilmsAmorphous SolidThin Film Processing

References

	Year	Citations

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