Publication | Closed Access
Atomic layer controlled deposition of Al2O3 films using binary reaction sequence chemistry
130
Citations
34
References
1996
Year
Materials ScienceAluminium NitrideChemical EngineeringEngineeringCorrosionSurface ScienceApplied PhysicsAl2o3 FilmsThin FilmsChemical DepositionAtomic LayerChemical Vapor DepositionThin Film Processing
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