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Process error limitations on binary optics performance
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1991
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PhotonicsProcess Error LimitationsOptical MaterialsDiffraction EfficiencyProcessing ErrorsOphthalmologyEngineeringOptical PropertiesGeometrical OpticDiffractive OpticComputer EngineeringFreeform OpticOptical SystemsOptical System AnalysisImage QualityOptical Computing
We present results characterizing the effects of processing errors on the performance of staircase kinoforms, commonly known as `binary optical devices.' Diffraction efficiency and modulation transfer function data are given for various types of processing errors present in staircase kinoforms of a f/10 Fresnel phase lens having two, four, and eight phase levels. Processing errors include etch depth, linewidth, and mask alignment. Processing errors, especially mask alignment, are shown to have the greatest impact on diffraction efficiency and very little effect on image quality.