Applied Physics Letters · 2000 · 97 citations · 15 references
Natural SciencesChemistryPhysicsPhysical ChemistryPlasma PhysicsSpectroscopyHigh-temperature PlasmasLow-temperature PlasmasPlasma-surface InteractionsElectron AttachmentElectron Attachment ProcessesGlow DischargesOptical Emission SpectroscopyPlasma ChemistryPlasma ProcessesSubstrate Temperature EffectsTemperature Dependence
Electron temperature measured by an optical-emission spectroscopy shows a strong substrate temperature dependence in a silane glow-discharge plasma. The electron temperature increases with time after turning on the plasma at a low substrate temperature of 150 °C, while it stays constant at a high substrate temperature of 400 °C. The electron temperature is drastically reduced when the source gas silane is diluted with hydrogen at low substrate temperatures. These results suggest that the electron temperature in silane plasma is strongly affected by an electron-attachment process to higher-order silane molecules whose formation reactions show negative activation energies with gas temperature and are also suppressed by the presence of hydrogen molecules.
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Dusty plasma formation: Physics and critical phenomena. Theoretical approach
A. A. Fridman, Laïfa Boufendi, T. Hbid et al. · Journal of Applied Physics · 1996 · 211 citations
Natural Sciences, Chemistry, Physics +16
Possible routes for cluster growth and particle formation in RF silane discharges
J. Perrin, C. Bohm, R. Etemadi et al. · Plasma Sources Science and Technology · 1994 · 121 citations
Natural Sciences, Chemistry, Physics +14