Concepedia

Deposition of Ti thin film using the magnetron sputtering method

Min J. Jung, Kyung H. Nam, L. R. Shaginyan, Jeon G. Han

Thin Solid Films · 2003 · 47 citations · 8 references

DOI

Concepts

References

8

Influence of high power densities on the composition of pulsed magnetron plasmas

Arutiun P. Ehiasarian, R. New, W.‐D. Münz et al. · Vacuum · 2002 · 302 citations

, , +9

Mechanisms for highly ionized magnetron sputtering

Jeffrey Hopwood, Fangfang Qian · Journal of Applied Physics · 1995 · 129 citations

, , +17

Characteristics of triode magnetron sputtering: the morphology of deposited titanium films

Luís César Fontana, J.L.R. Muzart · Surface and Coatings Technology · 1998 · 53 citations · Full text

, , +14

The mechanical and structural properties of Ti films prepared by filtered arc deposition

Avi Bendavid, PJ Martin, L.S. Wieluński et al. · Vacuum · 1996 · 27 citations

, , +13

Surface smoothing and roughening in sputtered SnO2 films

Tomas Lindström, J. Isidorsson, Gunnar A. Niklasson · Thin Solid Films · 2001 · 25 citations

, , +14