Broad fast neutral molecule beam sources for industrial-scale beam-assisted deposition

PLASMA ACCELERATOR WITH CLOSED ELECTRON DRIFT AND EXTENDED ACCELERATION ZONE.

А. И. Морозов, Yu. V. Esinchuk, G. N. Tilinin et al. · Soviet physics. Technical physics · 1972 · 144 citations

Natural Sciences, Physics, Particle Physics +8

Ion bombardment during thin film deposition and its influence on mechanical and chemical surface properties

Gerhard Wolf, Wolfgang Ensinger · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1991 · 58 citations

Natural Sciences, Materials Engineering, Materials Science +16

Low-energy ion bombardment of silicon dioxide films on silicon

Daniel V. McCaughan, V. T. Murphy · Journal of Applied Physics · 1973 · 33 citations

Engineering, Materials Engineering, Materials Science +17

Stress and adhesion of chromium and boron films deposited under ion bombardment

Martin Barth, Wolfgang Ensinger, Volker Hoffmann et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1991 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +12

Thirty-eight-centimeter ion source

H. R. Kaufman, William E. Hughes, R. S. Robinson et al. · Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms · 1989 · 20 citations