Redeposition—A serious problem in rf sputter etching of structures with micronmeter dimensions

Abstract

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation H. W. Lehmann, L. Krausbauer, R. Widmer; Redeposition—A serious problem in rf sputter etching of structures with micronmeter dimensions. J. Vac. Sci. Technol. 1 January 1977; 14 (1): 281–284. https://doi.org/10.1116/1.569140 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science and Technology Search Advanced Search |Citation Search