High rate etching of 6H–SiC in SF6-based magnetically-enhanced inductively coupled plasmas - Concepedia

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High rate etching of 6H–SiC in SF6-based magnetically-enhanced inductively coupled plasmas

28

Citations

11

References

2003

Year

D.W. Kim, Hyoyoung Lee, B.J. Park, H.S. Kim, Youngje Sung, Seung‐Hoon Chae, Young Wook Ko, G.Y. Yeom

Thin Solid Films

Materials ScienceEngineeringNanoelectronicsApplied PhysicsHigh Rate EtchingMicroelectronicsPlasma EtchingPlasma Processing

References

	Year	Citations

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