Publication | Closed Access
Molecular design for photo and electron beam lithography with thin films of coordination compounds
15
Citations
11
References
1996
Year
Materials ScienceEngineeringElectron-beam LithographyPhotochemistryBeam LithographySurface ScienceApplied PhysicsCoordination CompoundsChemistryThin FilmsMolecular EngineeringCoordination PolymerNanolithography MethodMolecular DesignSupramolecular Photochemistry
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