Charging Phenomena and Charge Compensation in AES on Metal Oxides and Silica

Hansheng Guo, Wolfgang Maus‐Friedrichs, V. Kempter

Surface and Interface Analysis · 1997 · 30 citations · 11 references

Concepts

Abstract

Charging processes on the bulk oxides Al2O3, ZrO2 and SiO2 occurring during Auger Electron Spectroscopy (AES) are studied. All samples experience a negative charge-up under the following parameters: electron beam energy >1 keV, current density >10-2 A cm-2 and different angles of incidence. The samples show strong history effects as a function of previous irradiation damage. For charge compensation, Environmental Auger Electron Spectroscopy with O2 gas is applied; several traditional methods were applied for comparison. Charging of SiO2 and ZrO2 could be reduced considerably in an O2 environmental pressure of <5×10-8 Torr. Charging of Al2O3 could be compensated completely in this oxygen environment. It is shown that for the compensation of the electron beam effects, including electron-stimulated desorption and carbon contamination of the surface, an O2 atmosphere of 5×10-8 Torr is more efficient than using an auxiliary electron gun or low-energy positive ions. It is also more efficient than an Ar environment of 1×10-4 Torr. © 1997 John Wiley & Sons, Ltd.

References

11