Applied Physics Letters · 1972 · 45 citations · 4 references
Materials SciencePulsed DcElectrical EngineeringElectromigration TechniqueEngineeringPulse DurationApplied PhysicsConductor StripesTransmission LineElectromigration DamagePulsed Electric FieldThin FilmsElectronic PackagingMicroelectronics
Thin Ti–Au films on sapphire were powered using pulsed dc. The incidence of electromigration damage is a complex function of pulse duration and repetition rate. For a given total ``exposure'' (fixed current density for a fixed total on-time) the damage may be reduced or eliminated by using duty cycles less than 100%.
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