Use of a theoretical model to investigate RF and DC reactive sputtering of titanium and chromium oxide coatings

Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

Peter Sigmund · Physical Review · 1969 · 3.5K citations

Natural Sciences, Physics, Atomic Physics +13

Handbook of Thin Film Technology

L. I. Maissel, R. Glang, Paul P. Budenstein · Journal of The Electrochemical Society · 1971 · 2.8K citations

Natural Sciences, Materials Engineering, Materials Science +12

Modeling of reactive sputtering of compound materials

S. Berg, Hans‐Olof Blom, T. Larsson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1987 · 373 citations

Natural Sciences, Materials Engineering, Materials Science +13

Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure

I. Petrov, Lars Hultman, J.‐E. Sundgren et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 238 citations

Natural Sciences, Materials Engineering, Materials Science +15

Structural, electrical and optical properties of sputtered vanadium pentoxide thin films

M. Benmoussa, E.A. Ibnouelghazi, A. Bennouna et al. · Thin Solid Films · 1995 · 225 citations

Natural Sciences, Materials Engineering, Materials Science +14