UV capillary force lithography for multiscale structures

Abstract

Rapid advances in information technology rely on novel patterning techniques. The authors present a simple UV capillary force lithography process, which allows one to imprint a multiscale system, consisting of 250 nm wide nanobridges and a 8–20 μm wide wiring in one lithography step. An additional annealing step for 5 min at 75 °C improved the capillary rise.