IEEE Electron Device Letters · 2002 · 74 citations · 6 references
EngineeringElectrical EngineeringPhysicsMicroelectronicsSemiconductor DevicesSemiconductor MaterialsBipolar Junction TransistorsHigh-frequency Semiconductor DevicesMicrowave Semiconductor DevicesRadio-frequency Integrated CircuitsSemiconductor HeterostructuresSemiconductor PhysicsBreakdown CharacteristicsCurrent Collector MaterialsEquivalent Circuit AnalysisEquivalent Circuit ModelingHeterojunction Bipolar TransistorsHigh-frequency ElectronicsHigh-frequency PerformanceRadio-frequency Devices
Describes 150-nm-thick collector InP-based double heterojunction bipolar transistors with two types of thin pseudomorphic bases for achieving high f/sub T/ and f/sub max/. The collector current blocking is suppressed by the compositionally step-graded collector structure even at J/sub C/ of over 1000 kA/cm/sup 2/ with practical breakdown characteristics. An HBT with a 20-nm-thick base achieves a record f/sub T/ of 351 GHz at high J/sub C/ of 667 kA/cm/sup 2/, and a 30-nm-base HBT achieves a high value of 329 GHz for both f/sub T/ and f/sub max/. An equivalent circuit analysis suggests that the extremely small carrier-transit-delay contributes to the ultrahigh f/sub T/.
6
M.J.W. Rodwell, Miguel Urteaga, Y. Betser et al. · International Journal of High Speed Electronics and Systems · 2001 · 66 citations
Kenji Kurishima, Hiroki Nakajima, S. Yamahata et al. · Japanese Journal of Applied Physics · 1995 · 43 citations