Character design and stamp algorithms for Character Projection Electron-Beam Lithography

Abstract

In this paper, we propose a series of methods, including character design, stencil compaction and layout matching for Character Projection (CP) Electron-Beam Lithography. We solve the problems with emphasis on inter-cell routing including wires and vias. For wire layout, we design a small set of regular characters after layout normalization. Then we partition the layout into several rows and adopt a greedy algorithm for layout matching in each row. For via layout, we utilize a minimum path covering algorithm to group vias into paths, which are contained in characters with bounded length. We devise an efficient method to compact all characters into a stencil with much less area than the total area of characters. Experimental results show that our algorithms achieve up to 83.42% and 67.29% of the maximum improved-throughput by CP against to Variable Shaped Beam (VSB) technology for wire and via layouts, respectively. Our characters can apply for general purpose layouts to save the high cost of generating different stencils for different layouts.